<> <> <> <> BSimMOS: CIRCUIT [gate, source, drain, bulk | L _ 2, W _ 20, Cox _ 11.8E-4pF --/um^2--, type _ 2, dutZratio _ 0 ] = { bsimModel: model _ BSimFromFile[gate, source, drain, bulk | <> L, -- Length (microns), later VFB (volts) W, -- Width (microns), later twoPhiF (volts) dutZratio, -- dutZRatio (W/L, 0 defaults to W/L ratio in file), later k1 (volts^0.5) 0, -- k2 () 0, -- eta () 0, -- beta0 (farads/(volt*second)) 0, -- u0 (1/volts) 0, -- u1 (1/volts) 0, -- x2beta0 0, -- x2eta 0, -- x3eta 0, -- x2u0 0, -- x2u1 0, -- beta0sat 0, -- x2beta0sat 0, -- x2beta0sat 0, -- x3u1 0, -- n0 ... I don't know in what order these last three go... 0, -- x2nb 0, -- x3nd 0, -- vdd (volts) 273.15+TDegC, -- temp (Kelvins) Cox*L*W, -- MCgbo (farads) (?) Cox*L*W*2.0/3.0, -- Cgbo23rds (farads) 0, -- maxFwdBias (Vbs excess over twoPhiF) (volts) 0, -- noCap (0 => compute capacitances, 1 => don't) type -- type (>0 => nChannel, <0 => pChannel, ABS[type]>1 selects process file "BSIMProcess-n.process") ]; i: current[drain, source] _ bsimModel[0]; cgb: capacitor[gate, bulk] _ bsimModel[1]; cgs: capacitor[gate, source] _ bsimModel[2]; cgd: capacitor[gate, drain] _ bsimModel[3]; }; -- BSimMOS BasicDifCap: CIRCUIT [cathode, anode | Co _ 0 -- farads --, PhiZero _ 0.9 -- junction built-in potential, volts --, Vt _ .026 -- kT/q, volts --, Io _ -5pA -- reverse current, amps --, VMax _ 0.6 -- volts --] = { sdCapModel: model _ SDDiode[cathode, anode | Co, 1/PhiZero, 1/Vt, Io, VMax]; ?: capacitor[cathode, anode] _ sdCapModel[0]; ?: current[cathode, anode] _ sdCapModel[1]; }; NMOSDifCap: CIRCUIT [dif, bulk | perim _ 0 --um--, area _ 0 --um^2-- ] = { ?:BasicDifCap[dif, bulk | Co _ 1.5E-4pF*area, PhiZero _ 0.90, --?-- Vt _ 1/(8.617E-5*(TDegC+273.16)), Io _ -5pA*area ]; ?:BasicDifCap[dif, bulk | Co _ 3.0E-4pF*perim, PhiZero _ 0.90, --?-- Vt _ 1/(8.617E-5*(TDegC+273.16)), Io _ -5pA*perim ]; }; PMOSDifCap: CIRCUIT [dif, bulk | perim _ 0 --um--, area _ 0 --um^2-- ] = { ?:BasicDifCap[bulk, dif | Co _ 3.1E-4pF*area, PhiZero _ 0.94, --?-- Vt _ 1/(8.617E-5*(TDegC+273.16)), Io _ -5pA*area ]; ?:BasicDifCap[bulk, dif | Co _ 3.0E-4pF*perim, PhiZero _ 0.94, --?-- Vt _ 1/(8.617E-5*(TDegC+273.16)), Io _ -5pA*perim ]; }; ETran: CIRCUIT [gate, source, drain | L _ 2, W _ 4, sdExtend _ 0, dWFact _ 1, type _ 2, dutZratio _ 0] = { nt: BSimMOS[gate, source, drain, Gnd | L _ L, W _ W, type _ type, dutZratio _ dutZratio]; dCap: NMOSDifCap[drain, Gnd | perim _ (sdExtend#0)*(2*sdExtend+W), area _ sdExtend*W ]; sCap: NMOSDifCap[source, Gnd | perim _ (sdExtend#0)*(2*sdExtend+W), area _ sdExtend*W]; }; -- ETran CTran: CIRCUIT [gate, source, drain | L _ 2, W _ 4, sdExtend _ 0, dWFact _ 1, type _ -3, dutZratio _ 0] = { pt: BSimMOS[gate, source, drain, Vdd | L _ L, W _ W, type _ type, dutZratio _ dutZratio]; dCap: PMOSDifCap[drain, Vdd | perim _ (sdExtend#0)*(2*sdExtend+W), area _ sdExtend*W ]; sCap: PMOSDifCap[source, Vdd | perim _ (sdExtend#0)*(2*sdExtend+W), area _ sdExtend*W]; }; -- CTran WireCap: circuit[n | -- l=length, w=width, a=area, p=perimeter lM2 _ 0, wM2 _ 4, aM2 _ 0, pM2 _ 0, -- 2nd layer metal lM _ 0, wM _ 3, aM _ 0, pM _ 0, -- 1rst layer metal lP _ 0, wP _ 2, aP _ 0, pP _ 0, -- poly aG_ 0, pG _ 0, -- poly over thin oxide (if transistor unsimulated) aM2C _ .197E-4pF, pM2C _ .486E-4pF, -- /(uM)^2, /uM, 2nd layer metal to bulk aMC _ .276E-4pF, pMC _ .496E-4pF, -- 1rst layer metal to bulk aPC _ .628E-4pF, pPC _ .577E-4pF, -- poly to bulk aGC _ 11.8e-4pF -- poly over thin oxide ] = { C: capacitor[n, Gnd] = Lambda*(Lambda*((aM2 + lM2*wM2)*aM2C + (aM + lM*wM)*aMC + (aP + lP*wP)*aPC + aG*aGC) + (pM2 + 2*lM2 + 2*wM2)*pM2C + (pM + 2*lM + 2*wM)*pMC + (pP + 2*lP)*pPC) }; -- WireCap Stray: circuit[n | aM2 _ 0, pM2 _ 0, aM _ 0, pM _ 0, aP _ 0, pP _ 0, anD _ 0, pnD _ 0, apD _ 0, ppD _ 0, aG _ 0, pG _ 0 ] = { wireCap: WireCap [n | aM2 _ aM2, pM2 _ pM2, aM _ aM, pM _ pM, aP _ aP, pP _ pP, aG _ aG, pG _ pG]; nCap: NMOSDifCap [n, Gnd | area _ Lambda*Lambda*anD, perim _ Lambda*pnD]; pCap: PMOSDifCap [n, Vdd | area _ Lambda*Lambda*apD, perim _ Lambda*ppD]; }; -- Stray